Profile measurements of dry etched structures

Dry etching is one of the most critical process steps in semiconductor fabrication, used to transfer circuit patterns from photoresist into the underlying material layers such as silicon dioxide, silicon …

lineWLI as Roughness Sensor for Wafers

Backgrinding reduces silicon wafers to the thickness required for advanced packaging. However, the grinding process leaves a damaged surface layer whose roughness directly determines die strength, downstream bonding yield, and …

Polka Dot Beam Splitter

Sample: A polka dot beam splitter (Thorlabs’ BPD254-FS) consists of 100 µm large metallic squares on top of a glass substrate. lineWLI technology measures the profile of one line in …